Q.1
14 MarksExplain the behaviour of MOS device under external bias with the help of energy band diagrams and derive the relationship for maximum depletion width at oxide- semiconductor surface.
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Explain the behaviour of MOS device under external bias with the help of energy band diagrams and derive the relationship for maximum depletion width at oxide- semiconductor surface.
Explain LOCOS technique used for device isolation and state its advantages over the Etched Field Oxidation technique.
Threshold voltage (VT), channel length modulation coefficient (λ), substrate-bias coefficient (γ), transconductance parameter (kn)
tox = 20 nm ΦGC = -0.85 V NA = 2 x 10⁵ cm-3 Qox = q x 2 x 10¹¹ C/cm²
Explain the latch-up problem observed in CMOS circuits and mention various techniques to prevent it.
Draw two-input CMOS NOR and NAND gate circuits. Identify the transistor/s suffering from body bias effect in each of these circuits. Assume single-well CMOS technology
Explain the basic principles of pass transistor circuits. Also explain logic “0” and logic “1” transfer.
What is the need of voltage bootstrapping? Draw MOSFET based voltage bootstrapping circuit and explain it in detail with mathematical derivations.
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Official Gujarat Technological University (GTU) examination paper for VLSI Technology & Design (Summer 2025, B.E. · EC Engineering, Sem 6). Features complete 70-mark regular & remedial examination pattern, official marking distribution across all 5 questions, and direct 1-click official PDF download.
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2161101 VLSI Technology & Design
Official GTU PDF · Summer 2025
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